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Where conventional testing and inspection techniques fall short at the microscale, optical methods offer a fast, robust, noninvasive, and cost-effective alternative for assessing the properties and quality of microsystems. These factors are crucial for the advancement of microsystems technology across various industries. The second edition of this comprehensive survey updates the most significant optical measurement techniques used in microsystem inspection. Under the guidance of Wolfgang Osten, expert contributors from global industrial and academic institutions share their knowledge on techniques such as image processing, light scattering, scanning probe microscopy, confocal microscopy, and more. The book also explores modern data acquisition and processing approaches, including surface feature determination and measurement uncertainty estimation. It emphasizes evaluating system properties and encapsulated components to enhance quality and reliability. Practical examples and illustrations reinforce the concepts presented. This resource provides an up-to-date overview of optical techniques for microsystem measurement and inspection, discussing various methodologies, including image correlation, displacement measurement, and electro-optic holography, while also covering the calibration of optical systems and the dynamics characterization of MEMS.
Achat du livre
Optical Inspection of Microsystems, Second Edition, Wolfgang Osten
- Langue
- Année de publication
- 2019
- product-detail.submit-box.info.binding
- (rigide),
- État du livre
- Très bon
- Prix
- 57,99 €
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- Titre
- Optical Inspection of Microsystems, Second Edition
- Langue
- Anglais
- Auteurs
- Wolfgang Osten
- Éditeur
- CRC Press
- Publié
- 2019
- Format
- rigide
- Pages
- 590
- ISBN10
- 1498779476
- ISBN13
- 9781498779470
- Séries
- Description
- Where conventional testing and inspection techniques fall short at the microscale, optical methods offer a fast, robust, noninvasive, and cost-effective alternative for assessing the properties and quality of microsystems. These factors are crucial for the advancement of microsystems technology across various industries. The second edition of this comprehensive survey updates the most significant optical measurement techniques used in microsystem inspection. Under the guidance of Wolfgang Osten, expert contributors from global industrial and academic institutions share their knowledge on techniques such as image processing, light scattering, scanning probe microscopy, confocal microscopy, and more. The book also explores modern data acquisition and processing approaches, including surface feature determination and measurement uncertainty estimation. It emphasizes evaluating system properties and encapsulated components to enhance quality and reliability. Practical examples and illustrations reinforce the concepts presented. This resource provides an up-to-date overview of optical techniques for microsystem measurement and inspection, discussing various methodologies, including image correlation, displacement measurement, and electro-optic holography, while also covering the calibration of optical systems and the dynamics characterization of MEMS.