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The book delves into the advancements and challenges in semiconductor materials, particularly focusing on diamond and aluminum nitride (AlN). It highlights the effectiveness of chemical vapor deposition (CVD) for growing diamond films but notes issues with dislocation densities. In contrast, high pressure and high temperature (HPHT) techniques yield higher purity diamond substrates, albeit in smaller sizes. Additionally, it addresses the difficulties in AlN crystal growth due to its high melting point and explores alternative methods like physical vapor transport and hydride/halide vapor phase epitaxy for larger bulk growth.
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Achieving Crystalline Perfection: Optimizing PVD for Superior Thin Film Quality, Richard
- Langue
- Année de publication
- 2024
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