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This book offers essential information for those interested in surface chemical analysis of materials at the nanometer scale. It presents a concise approach to quantitative analysis of surfaces and thin films using AES and XPS, grounded in practical application examples from materials science. The text begins with basic principles and develops them into useful equations, providing extensive guidance for both graduate students and experienced researchers. Key chapters focus on quantitative surface analysis and depth profiling, addressing recent advancements such as surface excitation parameters and backscattering correction factors. It derives fundamental relations for emission and excitation angle dependencies in analyzing bulk materials and fractional nano-layer structures, applicable to both smooth and rough surfaces. The book demonstrates how to optimize analytical strategies, improve signal-to-noise ratios, and enhance detection limits. It includes worked examples for quantifying alloys and layer structures in practical scenarios like contamination, evaporation, segregation, and oxidation, critically reviewing various quantification approaches. Additionally, it discusses contemporary issues in quantitative depth profiling, emphasizing sputter depth profiling and angle-resolved XPS and AES, while introducing the mixing-roughness-information depth (MRI) model and its extensions, considering preferential sputtering and electr
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Auger- and X-Ray Photoelectron Spectroscopy in Materials Science, Siegfried Hofmann
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- Année de publication
- 2014
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