Catalytic chemical vapor deposition
- 440pages
- 16 heures de lecture
This authoritative reference on catalytic chemical vapor deposition (Cat-CVD), authored by the technology's inventor, offers a comprehensive exploration from fundamentals to applications, including apparatus design. Contributions from four senior leaders in the field enhance the content, introducing techniques for observing Cat-CVD phenomena to deepen readers' understanding. The book begins with analytical tools for elucidating chemical reactions in Cat-CVD, such as laser-induced fluorescence and deep ultra-violet absorption, while detailing the underlying physics and chemistry. It provides an overview of the synthesis and properties of both inorganic and organic thin films prepared via Cat-CVD. The latter sections focus on the design and operation of Cat-CVD apparatuses and their applications. This resource delivers coherent coverage of Cat-CVD fundamentals and applications, consolidating the state of the art in this rapidly growing field, making it accessible for new researchers. It includes comparisons of different Cat-CVD methods, often absent in research papers, and bridges the gap between academic and industrial research, illustrating how CVD can transition from laboratory settings to large-scale industrial use in high-tech industries. This book serves as an invaluable resource for researchers and engineers in Cat-CVD, Hot-Wire CVD, iCVD, and related technologies.
