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Paramètres
- 272pages
- 10 heures de lecture
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Since the first edition was published in 2008, Atomic Layer Deposition (ALD) has emerged as a powerful, and sometimes preferred, deposition technology. The new edition of this groundbreaking monograph is the first text to review the subject of ALD comprehensively from a practical perspective. It covers ALD's application to microelectronics (MEMS) and nanotechnology; many important new and emerging applications; thermal processes for ALD growth of nanometer thick films of semiconductors, oxides, metals and nitrides; and the formation of organic and hybrid materials.
Achat du livre
Atomic Layer Deposition, Tommi Kääriäinen, David Cameron, Marja-Leena Kääriäinen, Arthur Sherman
- Langue
- Année de publication
- 2013
- product-detail.submit-box.info.binding
- (rigide),
- État du livre
- Abîmé
- Prix
- 166,31 €
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- Titre
- Atomic Layer Deposition
- Sous-titre
- Principles, Characteristics, and Nanotechnology Applications - 2nd Edition
- Langue
- Anglais
- Éditeur
- Wiley-Scrivener
- Publié
- 2013
- Format
- rigide
- Pages
- 272
- ISBN10
- 1118062779
- ISBN13
- 9781118062777
- Séries
- Mots clés
- États-Unis, Technologie, Chimie, Théories scientifiques, Nanotechnologie, Roi Arthur, Applications
- Description
- Since the first edition was published in 2008, Atomic Layer Deposition (ALD) has emerged as a powerful, and sometimes preferred, deposition technology. The new edition of this groundbreaking monograph is the first text to review the subject of ALD comprehensively from a practical perspective. It covers ALD's application to microelectronics (MEMS) and nanotechnology; many important new and emerging applications; thermal processes for ALD growth of nanometer thick films of semiconductors, oxides, metals and nitrides; and the formation of organic and hybrid materials.